コプレーナウェーブガイドを用いた強磁性共鳴測定法によるNi-Fe薄膜のダンピング定数評価
コプレーナウェーブガイドを用いた強磁性共鳴測定法によるNi-Fe薄膜のダンピング定数評価
カテゴリ: 論文誌(論文単位)
グループ名: 【A】基礎・材料・共通部門
発行日: 2011/07/01
タイトル(英語): Study on the Damping Constants of Ni-Fe Thin Films using Different CPW-FMR Measurements
著者名: 遠藤 恭(東北大学 大学院工学研究科 電気・通信工学専攻),三束 芳央(東北大学 大学院工学研究科 電気・通信工学専攻),島田 寛(東北大学 大学院工学研究科 電気・通信工学専攻),山口 正洋(東北大学 大学院工学研究科 電気・通信工学専攻)
著者名(英語): Yasushi Endo (Department of Electrical and Communication Engineering, Graduate School of Engineering, Tohoku University), Yoshio Mitsuzuka (Department of Electrical and Communication Engineering, Graduate School of Engineering, Tohoku University), Yutaka Shimada (Department of Electrical and Communication Engineering, Graduate School of Engineering, Tohoku University), Masahiro Yamaguchi (Department of Electrical and Communication Engineering, Graduate School of Engineering, Tohoku University)
キーワード: 強磁性共鳴,ダンピング定数,コプレーナ伝送線路,Sパラメータ,Ni-Fe薄膜 ferromagnetic resonance (FMR),damping constant,coplanar waveguide,S-parameter,Ni-Fe thin film
要約(英語): This paper reports the study on the damping constant α of Ni-Fe films using both one and two port type coplanar waveguide-ferromagnetic resonance (CPW-FMR) measurements, and compared these results with a conventional FMR (cavity-type FMR) measurement. In each CPW-FMR measurement, for the films thicker than 10 nm, each α becomes constant in the range of 0.012-0.014. On the other hand, for the film thickness less than 10 nm, α increases from 0.014 to 0.017 as the film thickness decreases, which may be attributed to structural inhomogeneity in the films. These results are in good agreement with those obtained from the cavity-type FMR measurement. On the basis of these results, it is pointed out that α of Ni-Fe films can be evaluated accurately by either of the CPW-FMR measurements. These results also mean that the one port type CPW-FMR measurement is more effective than the two port type CPW-FMR measurement for characterization of Ni-Fe films because the former method is simple and a stronger high frequency magnetic field can be generated.
本誌: 電気学会論文誌A(基礎・材料・共通部門誌) Vol.131 No.7 (2011) 特集:高周波マイクロ磁気応用技術の最前線
本誌掲載ページ: 505-510 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/131/7/131_7_505/_article/-char/ja/
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