レーザー誘起蛍光法を用いた大気圧パルスコロナ放電中の準安定準位N2(A3Σ+u),N原子,及びNO分子計測
レーザー誘起蛍光法を用いた大気圧パルスコロナ放電中の準安定準位N2(A3Σ+u),N原子,及びNO分子計測
カテゴリ: 論文誌(論文単位)
グループ名: 【A】基礎・材料・共通部門
発行日: 2011/07/01
タイトル(英語): Measurement of N2(A3Σ+u), N and NO under Atmospheric-Pressure Pulsed Positive Corona Discharge Using Laser-Induced Fluorescence
著者名: 寺本 慶之(東京大学大学院新領域創成科学研究科),小野 亮(東京大学大学院新領域創成科学研究科),小田 哲治(東京大学大学院電気系工学研究科)
著者名(英語): Yoshiyuki Teramoto (Graduate School of Frontier Sciences, The University of Tokyo), Ryo Ono (Graduate School of Frontier Sciences, The University of Tokyo), Tetsuji Oda (Graduate School of Electrical Engineering, The University of Tokyo)
キーワード: N原子,準安定準位N2(A3Σ+u),NO分子,パルスコロナ放電,レーザー誘起蛍光法 atomic nitrogen,metastable N2(A3Σ+u),NO molecule,pulsed corona discharge,laser-induced fluorescence
要約(英語): Density and temporal behavior of N2(A3Σ+u) metastable, N atom, and NO molecule are measured in pulsed positive corona discharge using time-resolved laser-induced fluorescence (LIF) under atmospheric pressure. In N2 discharge, the N2(A3Σ+u) density is independent of discharge voltage V, while the number of N2(A3Σ+u) molecules produced by the discharge increases with V because the thickness of the streamer increases with V. The absolute densities of N2(A3Σ+u) and N are measured using the decay rate of their densities after discharge by recombination reaction. In N2/O2(2%) discharge, the N density decreases after discharge, while the NO density is approximately constant after discharge because NO production reaction N + O2 → NO + O and its decomposition reaction N + NO → N2 + O are equilibrated. In N2/NO(250 ppm) discharge, it is shown that NO in the streamer is rapidly removed by N atoms within 3μs after discharge, then NO outside the streamer is slowly removed by diffused N atoms.
本誌: 電気学会論文誌A(基礎・材料・共通部門誌) Vol.131 No.7 (2011) 特集:高周波マイクロ磁気応用技術の最前線
本誌掲載ページ: 553-559 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/131/7/131_7_553/_article/-char/ja/
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