O2およびAr雰囲気での水上パルス放電におけるフェノール分解過程
O2およびAr雰囲気での水上パルス放電におけるフェノール分解過程
カテゴリ: 論文誌(論文単位)
グループ名: 【A】基礎・材料・共通部門
発行日: 2012/04/01
タイトル(英語): Phenol Decomposition Process by Pulsed-discharge Plasma above a Water Surface in Oxygen and Argon Atmosphere
著者名: 塩田 晴基(室蘭工業大学大学院 工学研究科 情報電子工学系専攻),板橋 秀幸(室蘭工業大学大学院 工学研究科 情報電子工学系専攻),佐藤 孝紀(室蘭工業大学大学院 工学研究科 情報電子工学系専攻/室蘭工業大学 環境科学・防災研究センター),伊藤 秀範(室蘭工業大学大学院 工学研究科 情報電子工学系専攻)
著者名(英語): Haruki Shiota (Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology), Hideyuki Itabashi (Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology), Kohki Satoh (Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology/Center of Environmental Science and Disaster Mitigation for Advanced Research, Muroran Institute of Technology), Hidenori Itoh (Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology)
キーワード: 汚染水浄化,パルス放電,フェノール水溶液,分解過程,ガスクロマトグラフィ質量分析法 water purification,pulsed discharge,phenol aqueous solution,decomposition process,gas chromatography mass spectrometry
要約(英語): By-products from phenol by the exposure of pulsed-discharge plasma above a phenol aqueous solution are investigated by gas chromatography mass spectrometry, and the decomposition process of phenol is deduced. When Ar is used as a background gas, catechol, hydroquinone and 4-hydroxy-2-cyclohexene-1-on are produced, and no O3 is detected; therefore, active species such as OH, O, HO2, H2O2, which are produced from H2O in the discharge, can convert phenol into those by-products. When O2 is used as a background gas, formic acid, maleic acid, succinic acid and 4,6-dihydroxy-2,4-hexadienoic acid are produced in addition to catechol and hydroquinone. O3 is produced in the discharge plasma, so that phenol is probably decomposed into 4,6-dihydroxy-2,4-hexadienoic acid by 1,3-dipolar addition reaction with O3, and then 4,6-dihydroxy-2,4-hexadienoic acid can be decomposed into formic acid, maleic acid and succinic acid by 1,3-dipolar addition reaction with O3.
本誌: 電気学会論文誌A(基礎・材料・共通部門誌) Vol.132 No.4 (2012) 特集:プロセスプラズマの発生と応用
本誌掲載ページ: 297-304 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/132/4/132_4_297/_article/-char/ja/
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