EUVレジストにおけるAcid-Sensitive Dyesを用いたPAGからの酸の発生挙動の解析

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2013/10/01

タイトル(英語): Analysis of the Generating Action of the Acid from PAG using Acid Sensitive Dyes for EUV Resist

著者名: 関口　淳（リソテックジャパン（株））

著者名(英語): Atsushi Sekiguchi (Litho Tech Japan Corporation)

キーワード: 化学増幅レジスト，酸発生剤，クエンチャー，クマリン6，EUVオープンフレーム露光ツール　　chemically amplified resist，photo acid generator，quencher，Coumarin 6，EUV open frame exposure tool

要約(英語): Researchers are currently examining various methods for determining the quantity of acid generated by a photoacid generator (PAG) and for analyzing acid-generating reactions using acid-sensitive dyes that react with acid and generate a color. Adding an acid-sensitive dye to the resist gives a clear grasp of the acid-generating action. The process involves applying a resist containing an acid-sensitive dye to a quartz substrate; exposing the substrate; and measuring and evaluating the absorbance of a chromogenic substance near 530nm using a spectroscope. The method determines the rate constant for acid generation (Dill C parameter) during exposure based on the relationship between transmissivity at 530nm and exposure dose. Using this method, we obtained and compared rate constants for acid generation (C parameters) as part of our study of dependence on the quantity of quencher in the EUV resist. Our results indicate a new model that accounts for the quencher concentration parameter would be useful in analyzing dependence on the quantity of quencher. This paper presents these findings, together with the results of studies of profile simulations using the quencher concentration parameter obtained in the experiments.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.133 No.10 （2013） 特集：リソグラフィとその関連技術・応用技術

本誌掲載ページ: 500-504 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/133/10/133_500/_article/-char/ja/