光ナノインプリントにおけるモールド全域での充填観察

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2013/10/01

タイトル(英語): Whole Field Observation of Resin Filling in UV Nanoimprint

著者名: 廣島　洋（産業技術総合研究所／JST-CREST），王　清（産業技術総合研究所／JST-CREST）

著者名(英語): Hiroshi Hiroshima (National Institute of Advanced Industrial Science and Technology/Japan Science and Technology Agency), Qing Wang (National Institute of Advanced Industrial Science and Technology/Japan Science and Technology Agency)

キーワード: 光ナノインプリント，樹脂充填，暗視野観察　　UV nanoimprint，resin filling，dark field observation

要約(英語): Whole field dark field monitoring system was constructed for observation of UV curable resin filling and detection of bubble defects of UV nanoimprint. Patterns with μm dimensions were observable by the monitoring system and filled/unfilled patterns were easily identified by the observed images. From full-area observations by the system, archipelago-like contact phenomenon was found in the contact front between a mold and UV curable resin on a wafer. The archipelagos were merged each other and were instantaneously banished with proceed of contact in the case of UV nanoimprint in pentafluoropropane (PFP). On the contrary, numerous bubbles were created even at unpatterned areas of a mold by the above phenomenon and were preserved for prolonged time in the case of UV nanoimprint in air. The portions detected by the monitoring system as unfilled were compared to the corresponding those images of UV nanoimprinted sample taken by an optical microscope at high magnifications. It was found that the monitoring system gives very correct evaluation of unfilled portions. The whole field dark field monitoring system is a simple but powerful tool for evaluation of resin filling processes.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.133 No.10 （2013） 特集：リソグラフィとその関連技術・応用技術

本誌掲載ページ: 505-508 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/133/10/133_505/_article/-char/ja/