6.x nm領域における希土類プラズマ極端紫外光源

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2013/10/01

タイトル(英語): Rare-earth Plasma Beyond Extreme Ultraviolet (BEUV) Sources at 6.x nm

著者名: 大塚　崇光（宇都宮大学大学院 工学研究科／School of Physics, University College Dublin），東口　武史（宇都宮大学大学院 工学研究科），湯上　登（宇都宮大学大学院 工学研究科）

著者名(英語): Takamitsu Otsuka (Faculty of Engineering, Utsunomiya University/School of Physics, University College Dublin), Takeshi Higashiguchi (Faculty of Engineering, Utsunomiya University), Noboru Yugami (Faculty of Engineering, Utsunomiya University)

キーワード: 極端紫外光リソグラフィー，極端紫外光，レーザー生成プラズマ　　extreme ultraviolet lithography (EUVL)，extreme ultraviolet (EUV)，laser-produced plasma (LPP)

要約(英語): We have studied self-absorption effects of a laser-produced plasma (LPP) source at 6.xnm as a function of laser pulse duration and viewing angle. The spectral profiles are shown to have a strong dependence on viewing angle. Absorption effects are less pronounced when a 150-ps pulse duration is used due to reduced opacity resulting from plasma expansion. Conversion efficiencies and ion energies are also measured as a function of laser pulse duration and laser power density. A maximum conversion efficiency of 0.4% within a 0.6% bandwidth was measured, and lower ion kinetic energy was observed. It is concluded that in order to reduce self-absorption effects and ion yields, and increase conversion efficiencies, a short pulse duration should be used.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.133 No.10 （2013） 特集：リソグラフィとその関連技術・応用技術

本誌掲載ページ: 526-531 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/133/10/133_526/_article/-char/ja/