ダイヤモンドライクカーボン成膜用低圧高周波CH4プラズマにおける基板への入射炭素フラックスに関する数値解析

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2014/01/01

タイトル(英語): Numerical Analysis on Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH4 Plasmas for Deposition of Diamond-Like Carbon Films

著者名: 小田　昭紀（千葉工業大学），上坂　裕之（名古屋大学）

著者名(英語): Akinori Oda (Chiba Institute of Technology), Hiroyuki Kousaka (Nagoya University)

キーワード: 高周波プラズマ，メタン，ダイヤモンドライクカーボン，シミュレーション　　radio-frequency plasmas，methane，diamond-like carbon，numerical simulation

要約(英語): Capacitively-coupled hydrocarbon (CH4) plasmas for deposition of diamond-like carbon films have been simulated using a self-consistent one-dimensional fluid model, incorporating the mass balance equations for electrons, ions, radicals and non-radicals, the electron energy balance equation, coupled with the Poisson equation. Despite of low-pressure CH4 gas condition, many positive-ion species, such as C2H4+, CH4+, C2H2+, CH5+ etc., have been found in the plasmas. The non-radical neutrals, such as C2H4, C3H8, C2H2 and C2H6, have also found with higher densities comparable to the source gas density. This result indicates that this complexity of background gas in CH4 plasmas is strongly affected to the electron energy distribution function, which is important for the determination of plasmas properties.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.134 No.1 （2014） 特集：2014年 研究開発の動向と最前線

本誌掲載ページ: 53-59 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/134/1/134_53/_article/-char/ja/