Ar-O2混合ガス表面波プラズマによるポリイミドの親水化処理における酸素ラジカルの効果

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2014/02/01

タイトル(英語): Effect of Oxygen Radical in Hydrophilization Treatment of Polyimide using Ar-O2 Mixture Gas Surface Wave Plasma

著者名: 蛭川　能成（東京都市大学），小野　茂（東京都市大学）

著者名(英語): Yoshinari Hirukawa (Tokyo City University), Shigeru Ono (Tokyo City University)

キーワード: 表面波プラズマ，表面改質，ポリイミド，電子温度，電子密度，酸素ラジカル密度　　surface wave plasma，surface modification，polyimide，electron temperature，electron density，oxygen radical density

要約(英語): Hydrophilic treatment of polyimide has been investigated using Ar-O2 mixture gas surface wave plasma apparatus. As results, sufficient hydrophilic treatment has been observed in the position well away from a dielectric plate for surface wave plasma generation. Spatial distribution of electron temperature and electron density showed the rapid decrease with increasing distance from the dielectric plate. However, catalytic probe measurement of atomic oxygen radical density showed the high oxygen radical density in the position well away from the dielectric plate. Hydrophilic treatment experiment was conducted at different two positions by adjusting treatment time to accomplish same oxygen radical amount reaching. Water contact angle of these two treated sample showed good agreement. Important contribution of the atomic oxygen radical in the downstream region of surface wave plasma had been shown through the hydrophilic processing experiment of polyimide.

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.134 No.2 （2014）

本誌掲載ページ: 91-97 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/134/2/134_91/_article/-char/ja/