RFプラズマCVD法による窒化ホウ素膜の堆積

カテゴリ: 論文誌(論文単位)

グループ名: 【A】基礎・材料・共通部門

発行日: 2014/06/01

タイトル(英語): Deposition of Boron Nitride Films using RF Plasma CVD Method

著者名: 稲尾　拓朗（室蘭工業大学大学院 工学研究科 情報電子工学系専攻），熊懐　正彦（室蘭工業大学大学院 工学研究科 情報電子工学系専攻），佐藤　孝紀（室蘭工業大学大学院 工学研究科 情報電子工学系専攻／室蘭工業大学 環境科学・防災研究センター），吉野　正樹（北海道職業能力開発大学校 電子情報技術科），伊藤　秀範（室蘭工業大学大学院 工学研究科 情報電子工学系専攻）

著者名(英語): Takuro Inao (Division of Information and Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology), Masahiko Kumadaki (Division of Information and Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology), Kohki Satoh (Division of Information and Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology/Center of Environmental Science and Disaster Mitigation for Advanced Reserch, Muroran Institute of Technology), Masaki Yoshino (Department of Electronic and Information Technology, Hokkaido Polytechnic College), Hidenori Itoh (Division of Information and Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology)

キーワード: 窒化ホウ素，薄膜，プラズマCVD法，DCバイアス電圧，フーリエ変換型赤外吸収分光法，ビッカース硬度　　boron nitride，thin film，plasma CVD method，DC bias voltage，fourier transform infrared spectroscopy，vickers hardness

要約(英語): Recently, as a great demand for high-strength and high-hardness materials is rising, improvement in performance of tools which manufacture those materials is being needed. Generally, tools to manufacture such materials are given high-hardness coating. Diamond and DLC (diamond like carbon) film are regarded as typical high-hardness materials, though, they can't be given to iron tools because carbons contained in them have high reactivity to iron. Consequently, the boron-nitride film which doesn't contain any carbons is expected as a coating material which can be adapted to iron tools. In this research, we prepared boron-nitride thin films on Si substrate using RF plasma CVD (chemical vapor deposition) method apparatus with a gas mixture of argon, nitrogen and trimethylborate (TMB: B(OCH3)3).

本誌: 電気学会論文誌A（基礎・材料・共通部門誌） Vol.134 No.6 （2014）

本誌掲載ページ: 397-401 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejfms/134/6/134_397/_article/-char/ja/