イオンアシスト蒸着によるフッ素系高分子薄膜の作製

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2012/09/01

タイトル(英語): Preparation of Fluoropolymer Thin Films by Ion-Assisted Vapor Deposition Polymerization

著者名: 泉田　和夫（東京農工大学大学院工学研究院），松田　剛（東京農工大学大学院工学研究院），田中　邦明（東京農工大学大学院工学研究院），臼井　博明（東京農工大学大学院工学研究院）

著者名(英語): Kazuo Senda (Tokyo University of Agriculture and Technology), Tsuyoshi Matsuda (Tokyo University of Agriculture and Technology), Kuniaki Tanaka (Tokyo University of Agriculture and Technology), Hiroaki Usui (Tokyo University of Agriculture and Technology)

キーワード: イオンアシスト蒸着，蒸着重合，フッ素系高分子，フッ化アルキルアクリレート，反射防止膜　　ion-assisted deposition，deposition polymerization，fluoropolymer，fluorinated alkylacrylate，antireflective coating

要約(英語): Fluoropolymer thin films were deposited by vapor deposition polymerization of 2-(perfluorohexyl) ethylacrylate (Rf-6) under irradiation by low energy Ar ions. Polymerization of Rf-6 was enhanced by increasing the ion energy, while no films were obtained without the ion irradiation. However, the surface energy also increased with increasing ion energy. At the optimum energy of 100 eV, uniform fluoropolymer thin films having surface energy of 10mJ/m2 were obtained. The films were insoluble to organic solvents. The film had low refractive index of 1.371, which makes it attractive as an antireflective coating. By depositing a 100-nm thick polymerized film of Rf-6, the reflectivity of a glass substrate was reduced by 3.37% at a wavelength of 590nm. It is expected that the deposition-polymerized films of Rf-6 is attractive as antireflective and antipollution coatings on flexible devices.

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.132 No.9 （2012） 特集：有機半導体－材料・デバイス・評価技術

本誌掲載ページ: 1413-1417 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/132/9/132_1413/_article/-char/ja/