設計データに基づく測長SEM撮像シーケンス自動生成

カテゴリ: 論文誌(論文単位)

グループ名: 【C】電子・情報・システム部門

発行日: 2015/04/01

タイトル(英語): Automatic Generation of Imaging Sequence for CD-SEM Using Design Data

著者名: 宮本　敦（（株）日立製作所 横浜研究所），松岡　良一（（株）日立ハイテクノロジーズ）

著者名(英語): Atsushi Miyamoto (Hitachi, Ltd., Yokohama Research Laboratory), Ryoichi Matsuoka (Hitachi High-Technologies Corporation)

キーワード: 測長SEM，撮像シーケンス，設計データ，アドレッシング点，オートフォーカス点　　CD-SEM，imaging sequence，design data，addressing point，auto-focus point

要約(英語): Critical Dimension Scanning Electron Microscope (CD-SEM) is widely used as a measurement tool of semiconductor patterns. It is necessary to set imaging sequence including corrections of imaging position and focusing of electron beam for the reliable measurement. Conventionally, addressing point (AP) and auto-focus point (AF) suitable for these processing are selected by the hand and this is a drop factor of SEM operation rates. We propose a technique to generate imaging sequence from design data of the pattern layout. Proposed method calculates selection indices for pattern complexity, uniqueness, and so on from design data and selects AP and AF templates automatically based on these indices. For 901 evaluation points, success rate of SEM imaging by proposed method was 100% and generation time of imaging sequence was 18 minutes. Compared with manual selection (conventionally it takes ten several hours by using SEM), large reduction of operation cost can be realized.

本誌: 電気学会論文誌C（電子・情報・システム部門誌） Vol.135 No.4 （2015） 特集：知覚情報技術の最前線

本誌掲載ページ: 444-452 p

原稿種別: 論文／日本語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejeiss/135/4/135_444/_article/-char/ja/