SiトレンチのSOG埋込による近接デュアルAFM探針と磁歪膜積層デュアルカンチレバーの作製
SiトレンチのSOG埋込による近接デュアルAFM探針と磁歪膜積層デュアルカンチレバーの作製
カテゴリ: 論文誌(論文単位)
グループ名: 【E】センサ・マイクロマシン部門
発行日: 2014/04/01
タイトル(英語): Self-align Fabrication of Narrow-gapped Dual AFM Tip using Si Trench Refilling with SOG and Magneto-strictive Film Stacked Dual Cantilever Formation
著者名: 川島 健太(山形大学大学院理工学研究科),峯田 貴(山形大学大学院理工学研究科),牧野 英司(弘前大学大学院理工学研究科),川島 貴弘(豊橋技術科学大学),柴田 隆行(豊橋技術科学大学)
著者名(英語): Kenta Kawashima (Graduate school of Science and Engineering, Yamagata University), Takashi Mineta (Graduate school of Science and Engineering, Yamagata University), Eiji Makino (Graduate school of Science and Technology, Hirosaki University), Takahiro Kawashima (Toyohashi University of Technology), Takayuki Shibata (Toyohashi University of Technology)
キーワード: 近接化,デュアルAFM探針,SOGによるトレンチ埋め込み,デュアルAFMカンチレバー,磁歪膜 narrow-gapped,dual AFM tip,trench refilling with SOG,dual AFM cantilever,magneto-strictive film
要約(英語): This paper reports on a novel self-align fabrication process of narrow-gapped dual AFM (Atomic force microscopy) tip. The dual AFM tip was fabricated on (100) orientated Si substrate by using narrow trench etching, trench refilling with SOG (spin-on-glass), CMP (chemical-mechanical-polishing), and Si crystalline anisotropic etching. Through the process, a sharp dual AFM tip with a gap of 500 nm, which was defined by only the etched trench, width was successfully fabricated. Although other fabrication process using an acrylic-nitrile-styrene-epoxy resin refilling was also attempted, dual tip was not obtained due to the poor adhesion of the resin in silicon etching process. In addition, a dual AFM cantilever (Magneto-storictive film/Si 2.0 μm) was formed by MEMS fabrication process. The fabricated FePd 0.4 μm/Si 2.0 μm and Ni 1.3 μm/Si 2.0 μm cantilever were individually deflected to 1.4 μm at 300 Gauss and 0.4 μm at 240 Gauss due to effects of magnetic flux and negative-magneto-striction, respectively.
本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.134 No.4 (2014)
本誌掲載ページ: 90-95 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/134/4/134_90/_article/-char/ja/
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