3C-SiCナノシートにおける量子閉じ込め効果とピエゾ抵抗特性シミュレーション
3C-SiCナノシートにおける量子閉じ込め効果とピエゾ抵抗特性シミュレーション
カテゴリ: 論文誌(論文単位)
グループ名: 【E】センサ・マイクロマシン部門
発行日: 2016/11/01
タイトル(英語): Quantum Confinement and Piezoresistivity Simulation in 3C-SiC Nanosheet
著者名: 中村 康一(京都大学 学際融合教育研究推進センター/エジプト日本科学技術大学 材料工学専攻)
著者名(英語): Koichi Nakamura (Center for the Promotion of Interdisciplinary Education and Research (C-PiER), Kyoto University/Department of Materials Science and Engineering, Egypt-Japan University of Science and Technology (E-JUST))
キーワード: 3C-SiC,ナノシート,ピエゾ抵抗,第一原理シミュレーション,量子閉じ込め 3C-SiC,Nanosheet,Piezoresistivity,First-principles simulation,Quantum confinement
要約(英語): The piezoresistivity in beta silicon carbide (3C-SiC) ultra-thin nanosheet with (001) surface orientation has been simulated on the basis of first-principles calculations of model structures. Electronic structure of the 3C-SiC nanosheet model with about 4 nm thickness has been completely verified in terms of the quantum confinement by the projection of the 3-dimensional multi-valley conduction band for bulk 3C-SiC onto the 2-dimensional reciprocal-lattice plane. For the ultra-thin 3C-SiC nanosheet models of less than 2 nm thickness, original features of themselves in electronic state can be observed beyond the quantum confinement concept. The strain response to carrier conductivity of n- or p-doped nanosheet models were calculated using band densities and their effective mass tensors with respect to carrier concentration and temperature. In the p-doped state, much larger longitudinal and transverse gauge factors for [110] direction were evaluated with the same qualitative character as p-type bulk 3C-SiC, on the condition that thickness is more than 2 nm under the quantum confinement effect.
本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.136 No.11 (2016) 特集:マイクロマシン・MEMSを支えるナノテク技術
本誌掲載ページ: 465-472 p
原稿種別: 論文/日本語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/136/11/136_465/_article/-char/ja/
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