Non-Mutative Cell Viability Measurement on an IGZO Transparent Thin Film Transistor Electrode Array
Non-Mutative Cell Viability Measurement on an IGZO Transparent Thin Film Transistor Electrode Array
カテゴリ: 論文誌(論文単位)
グループ名: 【E】センサ・マイクロマシン部門
発行日: 2020/08/01
タイトル(英語): Non-Mutative Cell Viability Measurement on an IGZO Transparent Thin Film Transistor Electrode Array
著者名: Grant A. Cathcart (Research Center for Advanced Science and Technology (RCAST), The University of Tokyo), Agnes Tixier-Mita (Institute of Industrial Science (IIS), The University of Tokyo/Research Center for Advanced Science and Technology (RCAST), The Un
著者名(英語): Grant A. Cathcart (Research Center for Advanced Science and Technology (RCAST), The University of Tokyo), Agnes Tixier-Mita (Institute of Industrial Science (IIS), The University of Tokyo/Research Center for Advanced Science and Technology (RCAST), The University of Tokyo), Satoshi Ihida (Institute of Industrial Science (IIS), The University of Tokyo), Anne-Claire Eiler (Research Center for Advanced Science and Technology (RCAST), The University of Tokyo), Hiroshi Toshiyoshi (Institute of Industrial Science (IIS), The University of Tokyo)
キーワード: Impedance,BioTFT,HepG2,Cell Viability
要約(英語): In this work we present the use of a transparent thin film transistor (tTFT) substrate to perform non-mutative cell viability measurements through purely electrical means. This is done through the measurement of the impedance of a region of the cellular culture and monitoring its change. By mapping this with simultaneous fluorescent measurements we managed to build predictive models for cell viability that obviate the need for mutative dyes while still enabling their use for simultaneous or subsequent measurement.
本誌: 電気学会論文誌E(センサ・マイクロマシン部門誌) Vol.140 No.8 (2020)
本誌掲載ページ: 193-200 p
原稿種別: 論文/英語
電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/140/8/140_193/_article/-char/ja/
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