Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02

カテゴリ: 論文誌(論文単位)

グループ名: 【E】センサ・マイクロマシン部門

発行日: 2022/09/01

タイトル(英語): Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02

著者名: Akio Higo (Systems Design Lab, School of Engineering, The University of Tokyo), Tomoki Sawamura (School of Engineering, The University of Tokyo), Makoto Fujiwara (Systems Design Lab, School of Engineering, The University of Tokyo), Eric Lebrasseur (System

著者名(英語): Akio Higo (Systems Design Lab, School of Engineering, The University of Tokyo), Tomoki Sawamura (School of Engineering, The University of Tokyo), Makoto Fujiwara (Systems Design Lab, School of Engineering, The University of Tokyo), Eric Lebrasseur (Systems Design Lab, School of Engineering, The University of Tokyo), Ayako Mizushima (School of Engineering, The University of Tokyo), Etsuko Ota (Systems Design Lab, School of Engineering, The University of Tokyo), Yukinori Ochiai (Systems Design Lab, School of Engineering, The University of Tokyo), Taro Arakawa (Graduate School of Engineering, Yokohama National University), Yoshio Mita (Systems Design Lab, School of Engineering, The University of Tokyo/School of Engineering, The University of Tokyo)

キーワード: character projection，variable-shaped beam，electron beam lithography，silicon photonics，optical racetrack resonator

要約(英語): Character Projection (CP) method and variable-shaped beam (VSB) are very unique and powerful drawing methods for high-throughput electron Beam (EB) lithography system. These methods have much interests to the industries due to the wafer scale exposure capability and time effective in the order of magnitude. However, the tradeoff of the exposure quality according to the EB exposure pattern approximation methods has not yet been comprehensively studied. Our study is essential for photonics because target patterns are curbed waveguide. We propose 100 nm octangular CP sleeving methods with several overlap parameters for the optical racetrack resonator test structure. Two approximation techniques were tried such as 100 nm octagonal CP and fine variable-shaped rectangles. Optical measurement clearly revealed quality differences between these methods, and this method is very useful for the curved structure and time effective technique.

本誌: 電気学会論文誌E（センサ・マイクロマシン部門誌） Vol.142 No.9 （2022） 特集：次世代社会基盤を支えるIoT，センシングシステムのための要素技術

本誌掲載ページ: 230-234 p

原稿種別: 論文／英語

電子版へのリンク: https://www.jstage.jst.go.jp/article/ieejsmas/142/9/142_230/_article/-char/ja/